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nodular PVA brush Description:
Various cleaning and processing steps are required during semiconductor wafer manufacturing,Nodular roller is used for semiconductor field, hard disk, wafer industrial for the surface cleaning and treatment such as remove the dust,residule and chemical on the wafer surface to ensure the surface smooth and cleanliness, besides this, it also used for wafer water absorb and moisturize. It have unique shape which is customized by your requirement to suit for your machine.PVA Brush roller also has the feature of high cleanness without dust drop out, it's most people's best prefer. 
Physical characteristics of PVA Brush roller
| 30% compressive stress | 110-120 g/cm2 |
| Apparent Density | 0.11-0.13 g/cm3 |
| Tensile Strength | 4.7-5.6 kgf/cm2 |
|
Elongation at Break
|
320%
|
|
Tearing Strength
|
2.3 ~ 2.6 kgf/cm
|
|
Porosity
|
90 ~ 92%
|
|
AVG pore size
|
100 ~ 130um
|
Chemistry solvent or detergent effects
| Chemistry solvent or detergent | Effects |
| 3% sodium hydroxide(NaOH) | harder |
| 3% Potassium Hydroxide(KOH) | harder |
| Dehydroacetic Acid | Yellowish appearance |
| 5% Sulfuric Acid | A little shrunk |
| TCL300 2% | Light yellowdish appearance |
| 50% eTHANOL | Softer |
Storage environment condition for PVA Brush:
1.Temperature: Room temperature
2. Humidity:30-50% relative humidity
3. Exterior package integrity and avoid sunlight
4. Max storage shelf life is 12 month after manufactured data (in standard storage environment condition)
5. Suggest to use under 6 months to get best performance.
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