Puwei's Aluminum Nitride Ceramic Substrates provide the ultimate thermal management foundation for advanced thick film hybrid microcircuits. Engineered to excel in demanding electronic packaging applications, they combine exceptional thermal conductivity (170-230 W/m·K) with superior electrical insulation, directly addressing heat dissipation and reliability challenges in modern power devices and high-frequency modules. This makes them an indispensable component for next-generation microelectronics and high-reliability systems.

Puwei AlN substrates are engineered to solve the critical challenges facing designers of hybrid micro circuits and power electronics. Unlike traditional Alumina Ceramic Substrate (Al2O3), our AlN platform delivers superior thermal performance without compromising electrical isolation.

Our AlN substrates are manufactured to precise specifications, ensuring consistent performance for high-reliability applications in aerospace, automotive, and telecommunications.
Follow these key steps to seamlessly integrate Puwei AlN substrates into your microelectronics packaging line and achieve optimal results with your thick film hybrid microcircuits:
Puwei AlN substrates are specified by engineers worldwide for applications where thermal management and reliability are paramount:
Used as a baseplate for IGBT modules, DC-DC converters, and motor drives. AlN's superior heat spreading capability is critical for managing losses from high-current power devices in compact, under-hood environments where reliability is non-negotiable.
Ideal substrate for microwave components such as RF power amplifiers, filters, and switches in 5G base stations, satellite communications, and radar systems, where stable electrical properties at GHz frequencies are paramount for microwave applications.
The preferred choice for high-reliability thick film hybrid microcircuits used in aerospace, defense, and medical equipment, where performance cannot be compromised and thermal management is critical for long-term stability.
Provides a stable, insulating platform for sensor packaging, particularly for temperature, pressure, or flow sensors operating in demanding conditions, ensuring accuracy and long-term stability in industrial process control.
AlN's high thermal conductivity makes it ideal for optoelectronics applications including laser diode mounts and high-power LED substrates, where efficient heat extraction directly impacts optical performance and device lifetime.

Puwei provides tailored AlN substrate solutions to meet your exact electronic packaging requirements. Our engineering team collaborates with you to optimize substrate specifications for your specific application and manufacturing process:
Our vertically integrated manufacturing ensures consistent, high-quality AlN substrates batch after batch. From raw material synthesis to final inspection, every step is controlled and documented:
All processes are continuously monitored using Statistical Process Control (SPC) to maintain tight process windows and exceptional batch-to-batch consistency.
Puwei's commitment to quality and environmental responsibility is certified and documented:
The surface finish of your AlN substrate significantly impacts thick film adhesion and line definition. For most conductor pastes (Ag, Au, AgPd), a ground finish (Ra 0.3-0.6 µm) provides optimal mechanical interlocking. For fine-line printing (<100 µm lines/spaces), a polished surface (Ra <0.1 µm) may be specified. Our engineers can recommend the ideal finish based on your specific paste system and line width requirements for thick film hybrid microcircuits.
To fully leverage AlN's 170-230 W/m·K thermal conductivity, consider the complete thermal path: junction-to-substrate thermal resistance (influenced by die attach material and voiding), substrate spreading resistance, and substrate-to-heatsink interface. Our substrates can be specified with metallized backside for direct soldering or sintering to baseplates, minimizing thermal interface resistance.
With CTE of ~4.5 ppm/K, AlN closely matches silicon (2.6 ppm/K) and other semiconductor materials, significantly reducing thermal stress during power cycling compared to Alumina Ceramic Substrate (Al2O3) (CTE ~7 ppm/K). This makes AlN the preferred choice for large-area die attachments and multi-chip modules requiring high reliability under thermal cycling.
While AlN is compatible with most commercial thick film pastes, some formulations may require modified firing profiles or specific surface treatments. We maintain technical data on paste compatibility and can provide substrate samples for your in-house process qualification before volume production.
Puwei's Aluminum Nitride Ceramic Substrates represent the convergence of advanced materials science and precision manufacturing. By solving critical thermal and electrical challenges, they empower you to build more powerful, reliable, and compact electronic systems for the global market. Whether for high-frequency modules, power electronics, or advanced microelectronics packaging, our substrates provide the foundation for innovation.
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Alumina Ceramic Substrates,
Aluminum Nitride Substrates,
Metallized Ceramics,
AlN Ceramics Disc,
DPC Substrate ,
DBC Ceramic Substrate